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    First International Workshop on Advanced Patterning Solutions (IWAPS) held on October 12-13, 2017 was a great success with a record number of 21 speakers and over 200 attendees from around the world. This workshop was held under the auspices of the Integrated Circuit Industry Technology Innovation Alliance in China (ICTIA), undertaken by Institute of Microelectronics of Chinese Academy of Science (IMECAS) and sponsored by SMIC, YMTC, Huahong Group, Mentor, ASML, KLA Tencor, Nata, SMEE, Synopsys, Toppan, JSR, DJEL and KINGSEMI.

    At the beginning of the workshop, Jianlin Cao (president of IWAPS, chairman of ICTIA, former vice minister of Ministry of Science and Technology) , Junru Ma (the former director of the Bureau of the State Administration of Foreign Experts) and Gang Qiu (deputy inspector of Key Special Affairs Office of Ministry of Science and Technology, vice director of 02 Special Implementation Management Office) made the opening speech for the workshop successively. Tianchun Ye, vice president of IWAPS and director of IMECAS, made an analysis report about current industry trends.

    Secretary general of IWAPS Yayi Wei who is also the director of Computational Lithography R&D Center in IMECAS presided over the opening ceremony. Professors, fellows, managers and engineers from intel, IBM, Qualcomm, AMD, ASML, SMIC and so on were invited to make reports about computational lithography technology toward 7nm and below, SMO, DTCO, EUV, DSA, Design rules, Advanced Lithography Material, lithography equipment, etc.

    The Workshop provides an environment where leading researchers and engineers from various disciplines in patterning can share their thoughts and ideas. The speakers at the Workshop are selected by invitation only and represent a broad range of disciplines and covering a wide array of different lithography approaches and requirements. Presentations are arranged to be comprehensive, covering the current practice, the future trend and the challenges ahead. The Workshop format is to provide an atmosphere for in-depth discussions among the attendees. This workshop also provides an opportunity for researchers and engineers who want to know more about the semiconductor R&D and business opportunity in China.

 

You can download IWAPS2017 to learn more details. 

 The 2nd International Workshop on Advanced Patterning Solutions (IWAPS) came to a successful close on October 19th, 2018. The two-day workshop was held under the auspices of Integrated Circuit Industry Technology Innovation Alliance in China (ICTIA), organized by Institute of Microelectronics of Chinese Academy of Science (IMECAS) and Xiamen Semiconductor Investment Group Co., Ltd, co-organized by Chinese Optical Society. Sponsors of the workshop included SMIC, YMTC, Huahong Group, Mentor, ASML, Photronics, KLA-Tencor, Nata, SMEE, Synopsys, Toppan, CYMER, JSR, DJEL, TEL, DOW, and ZEISS. More than 300 guests attended the workshop, all of whom came from distinguished enterprises and research institutions based in China, the U.S., Germany, Japan, etc. In accordance with the arrangement, the specially-invited guests made their reports on the proposed themes. After the workshop, a group photo of the participants was taken for commemoration.  

If you want to be sponsor of IWAPS-2019, please contact  suyajuan@ime.ac.cn.

 

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