Home About Us Committee Program Registration History

Home - Program

IWAPS2018 Presentation files download

1-A1_Intel_MarkPhillips_keynote.pdf

1-A3_ASML_WimdeBoeij_invited.pdf

1-P1_ASML-Brion_YuCao_invited.pdf

1-P2_Synopsys_YongdongWang_invited.pdf

1-P3_ICRD_QiangWu_invited.pdf

1-P6_CarlZeiss_ThomasScheruebl_invited.pdf

2-A2_Dow_GeorgeLu_invited.pdf

2-A3_AMAT_ChiILang_invited.pdf

2-A5_BIT_YanqiuLi_invited.pdf

2-P2_Nova_BarakBringoltz_invited.pdf

2-P5_Gigaphoton_SophiaHu.pdf

2S-P1_FudanUniv_ShishengXiong.pdf

2S-P2_Mentor_DavidWang.pdf

2S-P4_MarkNeisser.pdf

2S-P5_Energetiq_HuilingZhu.pdf

2S-P7_TongjiUniv_XingyuZhou.pdf

IWAPS2018_GroupPhoto

Cite: SpeakerName, "Presentation title," The 2nd International Workshop on Advanced Patterning Solutions (IWAPS-2018), Xiamen, China, 18-19 Oct. 2018

=================

Program Chairs: Yayi Wei, Kafai Lai, Ted Liang

Oct. 17~19 Registration

Oct. 18~19 8:30~17:30 IWAPS meeting


2018-10-09 Update. Note: Agenda is subject to change.

Please click here to download the Agenda_of_IWAPS2018

Invited Speakers:

Sponsors
Hosted by
CO-Organiser
Traffic/Hotel
Follow Us
please follow our Wechat public account for more information about lithography in China